京都大学大学院情報学研究科
複雑系科学専攻
〒606-8501 京都市左京区吉田本町
電話 075-753-5880
FAX: 075-753-4923
Email: kaneko@acs.i.kyoto-u.ac.jp
オフィス：総合研究８号館２０３号室
平成25年3月現在
研究活動
o
金子豊、樋渡保秋、小原勝彦、村上透、
薄膜成長のモンテカルロシミュレーション − 表面構造と格子欠陥 −
表面技術、第５１巻、１号、pp 81--86、(2000).
o Y. Kaneko, Y. Hiwatari, K. Ohara and T.
Murakami,
Monte Carlo Simulation of Thin Film Growth with Lattice Defects
Journal of the Physical Society of Japan, Vol. 69, No. 11, pp3607-3613 (2000).
o Y. Kaneko, Y. Hiwatari, K. Ohara and T.
Murakami,
Computer Simulation of Crystal Growth and Void Formation
Statistical Physics (AIP Conference Proceedings 519), pp575-577 (2000).
o Y. Kaneko, Y. Hiwatari, K. Ohara and T.
Murakami,
Surface Structure and Void Formation in Thin Film Growth : A Monte Carlo
Simulation
Prog. Theor. Phy. Suppl., No.138, pp126-127 (2000).
o Y. Hiwatari, Y. Kaneko, K. Ohara and T.
Murakami,
Kinetic Monte Carlo Simulation of Thin Film Growth with Void Formation - Application to Via Filling –
Technical Proceedings of the Fifth
International Conference on Modeling and Simulation of Microsystems, pp430-433,
(Computational Publications,
Boston, Geneva, San Francisco, 2002)
o 金子豊、樋渡保秋、小原勝彦、村上透、
欠陥生成を取り入れた薄膜成長のモンテカルロシミュレーション
− 孔埋め込みへの応用 −
表面技術、第５３巻、４号、pp 28--33、(2002).
o Y. Kaneko and Y. Hiwatari,
The Solid-by-Solid Model for Crystal Growth
and Electroplating : Kinetic Monte Carlo Simulation
Recent Research and Development of Physics
and Chemistry of Solids (Transworld Research
Network), pp.47-64 (2003).
o Y. Kaneko, Y. Hiwatari, K. Ohara and T.
Murakami,
Computer Simulation of Thin Film Growth and
Defect Formation
Surface and Coating Technology (Elsevier),
pp215-218 (2003).
o Y. Kaneko, Y. Hiwatari and K. Ohara,
Monte Carlo Simulation of Thin Film Growth
with Defect Formation : Application to Via Filling
Molecular Simulation, 30, No.13-15, pp895-899
(2004).
o Y.
Hiwatari, Y. Kaneko and H. Ishida
Molecular Simulation for Nanotechnologies :
Application to Industry
Molecular Simulation, 30, No.13-15, pp819-826
(2004).
o Y. Kaneko, T. Mikami,
Y. Hiwatari, and K. Ohara
Computer Simulation
of Electrodeposition : Hybrid of Molecular Dynamics
and Monte Carlo
Molecular Simulation, 31, No.6-7, pp429-433
(2005).
o Y. Kaneko, Hiwatari, K. Ohara and F. Asa
Monte Carlo
Simulation of Damascene Electroplationg: Effects of
Additives
Molecular Simulation, 32, No.15, pp1227-1232
(2007).
o Y. Hiwatari, Y. Kaneko, T. Mikami, K. Ohara and F. Asa
Molecular
Dynamics-Monte Carlo Hybrid Simulation of Thin Film Growth and Void Formation
in Electrodeposition Process
Molecular Simulation, 33, No.1-2, pp133-138
(2007).
o Y. Kaneko, Hiwatari, K. Ohara and F. Asa
Kinetic Monte Carlo Simulation of Via Filling : Role of Chloride Ions
ECS Transaction – Phoenix, AZ –
, Vol. 13, pp.1-9, 2008
o Y. Kaneko, Hiwatari, K. Ohara and F. Asa
Monte Carlo and Molecular Dynamics Studies of the Effects of Additives in Electrodepositio
Journal of the Korean Physical Society,
Vol. 54, No. 3, pp.1207- 1211, 2009
o Molecular Simulation Approach to the Effects of Additives in Electrodeposition Process
Nishimura, Y. Kaneko, Y. Hiwatari, K. Ohara and F. Asa
ECS Transaction - Honolulu, HI -
16(46) (2009) pp.83-92
o Simulation of Three-Dimensional Solid-by-Solid Model and Application
to Electrochemical Engineering
Y. Kaneko, Y. Hiwatari,
K. Ohara and F. Asa
ECS Transaction - Vancouver, CANADA
- 28(29) (2010) pp.1-7.
o
Kinetic Monte Carlo Approach to the Effects of Additives in Electrodeposition
Y. Kaneko, Y. Hiwatari, K. Ohara
and F. Asa
ECS Transaction - Montreal, CANADA - 35(27) (2011) pp.7-12.
o
Kinetic Monte Carlo simulation of three-dimensional shape evolution
using Solid-by-Solid model: Application to via and trench filling
Y. Kaneko, Y. Hiwatari,
K. Ohara and F. Asa
Electrochimica
Acta (2013) 掲載決定
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